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JGP-800 type magnetron sputtering coating equipment
Number: SN20150801135422766
Category: Magnetron sputtering coating equipment
  • product description
  • Specifications
  • service support

    Equipment use
    The product can be widely used in semiconductor, LED and photovoltaic industries. It is mainly used for the preparation of thin films of various metals, semiconductors and dielectric materials, which can meet the needs of scientific research and small batch production.

    Equipment composition
    The system is a single-chamber structure, which is mainly composed of a sputtering vacuum chamber, a magnetron sputtering target, ion bombardment, a revolution substrate table, a light heating system, a sputtering power supply, a working gas path, a vacuum obtaining system, a mounting machine, and a vacuum It consists of measurement, water cooling, alarm system and control system.
    The system is controlled by industrial computer and PLC, and has two modes of automatic and manual control. Except for taking and placing samples, all other operation processes are realized on the touch screen; providing man-machine operation interfaces such as vacuum system, sputtering process settings, and gas filling and degassing systems; parameters can be set on the industrial control computer through recipes to realize the program process and equipment Parameter setting.

    Technical index:

    model

    JGP-800

    Sputter chamber ultimate vacuum

    .0× 10 -6 Pa ≤8.0 × 10 -6 Pa

    Vacuum recovery time

    -3 Pa≤15min The system is pumped from the atmosphere to 1.0 × 10 -3 Pa≤15min

    Uniformity

    Non-uniformity of film thickness≤ ± 5%; non-uniformity between slices≤ ± 5%; non-uniformity between batches≤ ± 5%

    Sputtering vacuum chamber

    Cylindrical structure, size Ф800mmx250mm

    Magnetron sputtering system

    靶材尺寸6英寸; 4 permanent magnetic targets , target size 6 inches;

    Equipped with 1 imported power supply (RF or DC pulse optional);

    Sputtering rate: 0.5 to 5 Angstroms / second (target Al)

    Revolving substrate stage

    6 inches 6 pieces, (4 inches 12 pieces or 3 inches 16 pieces);

    Substrate revolution 3 ~ 15 revolutions / minute, continuously adjustable

    Light heating system

    Sample heating temperature: room temperature ~ 250 ° C, continuously adjustable;

    ±10°C; Unevenness of substrate temperature: ± 10 ° C;

    The temperature control mode is PID automatic temperature control and digital display, equipped with imported temperature control meter

    Working gas path

    2 way mass flow controller

    Extraction unit

    进口) 、管路等 Cryogenic pump (import), Roots dry pump unit, pneumatic gate valve ( import) , pipeline, etc.

    Vacuum measurement

    2 vacuum gauges (imported) to accurately detect the system vacuum, working vacuum and pre-stage vacuum; the vacuum degree can be displayed directly on the touch screen of the industrial computer; the vacuum degree of the sputtering coating process can be accurately monitored

    Control System

    The system is controlled by industrial computer (touch screen) and imported PLC to control the whole system

    Footprint

    Host

    ×1000mm 2 1500 × 1000mm 2

    Electric control cabinet

    ×700mm 2 (一个) 700 × 700mm 2 (one)

    Company: Shenyang Scientific Instrument Co., Ltd., Chinese Academy of Sciences  

    Address: No. 1 , Xinyuan Street, Hunnan New District, Shenyang

    024-23826855 Sales phone: 024-23826899 , 024-23826855

    After-sales telephone: 024-23826838

    Fax: 024-23826828

    Email: sales@sky.getrudesbreatheazy.org

    Website: getrudesbreatheazy.org

    Account Bank: CCB Shenyang Hunnan New District Industrial Park Branch Office

    Account number: 2100 1394 6010 5958 1266

    Tax ID: 912101 0041 0581 2660

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