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TRP-450 type magnetron sputtering system
Number: SN20151013152824655
Category: Magnetron Sputtering Coating System
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    Equipment use

    It is used for the preparation of nano-scale single-layer and multi-layer functional films, hard films, metal films, semiconductor films, dielectric films and other new thin-film materials. It can be widely used in scientific research and small batch preparation of thin film materials in universities and research institutes.

    Equipment composition

    The system mainly consists of a sputtering vacuum chamber, a permanent magnet magnetron sputtering target (three targets), a single substrate heating stage, a DC power supply, an RF power supply, a working gas path, an extraction system, a vacuum measurement, an electrical control system, and an installation machine. Taiwan and other parts.

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