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Home » Products » CVD Coating Equipment » PECVD Series Plasma Chemical Vapor Deposition Coating Equipment

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Cluster PECVD plasma chemical vapor deposition coating equipment
Number: SN20151013154824891
Category: PECVD series plasma chemical vapor deposition coating equipment
  • product description
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    Equipment use

    This equipment uses plasma enhanced chemical vapor deposition technology to deposit thin films such as silicon nitride, amorphous silicon and microcrystalline silicon on different substrate materials such as optical glass, silicon, quartz, and stainless steel to prepare amorphous silicon and microcrystalline Silicon thin film solar cell device. It can be widely used in scientific research and small batch preparation of thin film materials in universities and research institutes.

    Equipment composition

    The system is mainly composed of a central transfer chamber, three PECVD deposition chambers, and an in / out chamber, and two chamber interfaces are reserved for subsequent use.

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