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PECVD-300 plasma chemical vapor deposition coating equipment
Number: SN20151013154839762
Category: PECVD series plasma chemical vapor deposition coating equipment
  • product description
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    Equipment use

    This equipment uses plasma enhanced chemical vapor deposition technology to deposit thin films such as silicon nitride, amorphous silicon and microcrystalline silicon on different substrate materials such as optical glass, silicon, quartz, and stainless steel to prepare amorphous silicon and microcrystalline Silicon thin film solar cell device. It can be widely used in scientific research and small batch preparation of thin film materials in universities and research institutes.

    Equipment composition

    The system is mainly composed of a vacuum reaction chamber, an upper cover assembly, a hot wire rack, a substrate heating stage, a working gas path, an extraction system, an installation machine, a vacuum measurement and an electronic control system.

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